US Patent Issued to DERKWOO SEMITECH on Aug. 26 for "Particle transfer blocking device and lithography device using electron layer in vacuum system" (South Korean Inventor)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,822, issued on Aug. 26, was assigned to DERKWOO SEMITECH Co. LTD. (Seoul, South Korea).

"Particle transfer blocking device and lithography device using electron layer in vacuum system" was invented by Ki Bum Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a device designed to prevent fine particles produced in a vacuum system from being adsorbed to a semiconductor substrate and a sample or prevent the fine particles from being adsorbed to a mask in a lithography device using the vacuum system and, more specifically, to an extreme ultraviolet lithography device not using a membrane type pellicle...