US Patent Issued to DENKA on May 27 for "Chloroprene-based block copolymer, latex, latex composition, and rubber composition" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,433, issued on May 27, was assigned to DENKA COMPANY Ltd. (Tokyo).

"Chloroprene-based block copolymer, latex, latex composition, and rubber composition" was invented by Yushi Kumagai (Tokyo), Wataru Nishino (Tokyo), Yutaka Saito (Tokyo) and Naoki Kobayashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator. A chloroprene-based block copolymer, includes 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass ...