US Patent Issued to DENKA on July 15 for "Chloroprene copolymer latex, method for producing same, vulcanized product, dip molded article and method for producing same" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,044, issued on July 15, was assigned to DENKA COMPANY Ltd. (Tokyo).

"Chloroprene copolymer latex, method for producing same, vulcanized product, dip molded article and method for producing same" was invented by Masao Onozuka (Tokyo) and Hidehito Otsuka (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chloroprene copolymer latex containing a chloroprene copolymer having a structural unit derived from chloroprene and a structural unit derived from 2,3-dichloro-1,3-butadiene, in which a toluene insoluble content in the chloroprene copolymer is 50 to 95% by mass, and a modulus at 500% elongation of a film, which is obtained on a base material by ...