US Patent Issued to DENKA on Dec. 9 for "Chloroprene-based block copolymer, latex, latex composition, and rubber composition" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,279, issued on Dec. 9, was assigned to DENKA COMPANY Ltd. (Tokyo).

"Chloroprene-based block copolymer, latex, latex composition, and rubber composition" was invented by Hideharu Mori (Yonezawa, Japan), Wataru Nishino (Tokyo), Yushi Kumagai (Tokyo), Yutaka Saito (Tokyo) and Naoki Kobayashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent tensile properties and flexibility without the use of a vulcanizing agent or a vulcanizing accelerator having a chloroprene-based block copolymer, contains 5 to 30% by mass of a po...