US Patent Issued to Denka, NATIONAL INSTITUTE FOR MATERIALS SCIENCE on May 6 for "Electron source, manufacturing method therefor, and device comprising electron source" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,893, issued on May 6, was assigned to Denka Co. Ltd. (Tokyo) and NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Tsukuba, Japan).

"Electron source, manufacturing method therefor, and device comprising electron source" was invented by Hiromitsu Chatani (Tokyo), Daisuke Ishikawa (Tokyo), Jie Tang (Ibaraki, Japan), Tadakatsu Ohkubo (Ibaraki, Japan), Shuai Tang (Ibaraki, Japan), Jun Uzuhashi (Ibaraki, Japan) and Kazuhiro Hono (Ibaraki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method for an electron source according to the present disclosure includes steps of: (A) cutting out a chip from a block of an electron emission material, (B)...