ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,331, issued on Feb. 10, was assigned to DELTA ELECTRONICS INC. (Taoyuan, Taiwan).
"Fan rotor and manufacturing method thereof" was invented by Chao-Wen Lu (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure is directed to a fan rotor having an annular disk and a plurality of vanes. The vanes and the annular disk are formed as one piece by etching, the vanes are configured in a radial arrangement on the annular disk, each of the vanes is defined with a thickness greater than or equal to 0.03 mm and less than or equal to 0.1 mm, a groove is defined between each vane and another vane adjacent thereto, and each groove is defi...