ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,787, issued on July 8, was assigned to DELTA ELECTRONICS (SHANGHAI) Co. LTD. (Shanghai).
"Magnetic element" was invented by Jianxing Dong (Shanghai), Liang Wang (Shanghai), Teng Liu (Shanghai) and Jianping Ying (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "A magnetic element includes at least one first air gap. A first portion of the first air gap is arranged between the first projection line and the second projection line. A second portion of the first air gap is beyond the region between the third projection line and the fourth projection line. Due to the air gap, the dielectric constant between the first end part of the winding and the ...