US Patent Issued to Delta Design on Nov. 11 for "Method for determining corrective film pattern to reduce semiconductor wafer bow" (Washington Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,725, issued on Nov. 11, was assigned to Delta Design Inc. (Poway, Calif.).

"Method for determining corrective film pattern to reduce semiconductor wafer bow" was invented by Ryan J. Stoddard (Seattle), Jonathan L. Herlocker (Seattle) and Matt McLaughlin (Seattle).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is disclosed for generating a corrective film pattern for reducing wafer bow in a semiconductor wafer fabrication process. The method inputs to a neural network a wafer bow signature for a predetermined semiconductor fabrication step. The neural network generates from the input a corrective film pattern corresponding to the wafer bow si...