ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,121, issued on May 20, was assigned to DELMIC IP B.V. (Delft, Netherlands).
"Method and apparatus for inspecting a sample by means of multiple charged particle beamlets" was invented by Andries Pieter Johan Effting (Delft, Netherlands) and Sander Vincent Den Hoedt (Delft, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for inspecting a sample by means of a multi-beam charged particle inspection apparatus, and an apparatus for performing this method are provided. The multi-beam charged particle inspection apparatus is configured to project an array of charged particle beamlets within an exposure area on the sample. The apparatus i...