US Patent Issued to DELMIC IP on Aug. 19 for "Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope" (Dutch Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. RE50,540, issued on Aug. 19, was assigned to DELMIC IP B.V. (Delft, Netherlands).

"Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope" was invented by Jacob Pieter Hoogenboom (Delft, Netherlands), Nalan Liv Hamarat (Delft, Netherlands) and Pieter Kruit (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both ...