US Patent Issued to DeCarbon Technology (Shenzhen) on May 13 for "Silicon-based solid amine sorbent for CO 2 and making method thereof" (Chinese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,296,317, issued on May 13, was assigned to DeCarbon Technology (Shenzhen) Co. Ltd. (Shenzhen, China).

"Silicon-based solid amine sorbent for CO 2 and making method thereof" was invented by Zuotai Zhang (Shenzhen, China), Chunyan Li (Shenzhen, China), Feng Yan (Shenzhen, China), Xuehua Shen (Shenzhen, China) and Fan Qu (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A silicon-based solid amine sorbent for CO2 and the making method thereof including: providing a silicon source liquid which is a silicate solution or a liquid organosilicate, wherein the silicate solution comprises water and a first silicate dissolved in the water; mixing the...