ALEXANDRIA, Va., July 16 -- United States Patent no. D1,084,299, issued on July 15, was assigned to DCSTAR INC (New York).

"Mask" was invented by David Luo (New York).

The patent was filed on April 30, 2024, under Application No. D/940,072.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1084299&OS=D1084299&RS=D1084299

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