US Patent Issued to Dai Nippon Printing on Nov. 25 for "Method of quality determining of deposition mask, method of manufacturing deposition mask, method of manufacturing deposition mask device, method of selecting deposition mask, and deposition mask" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,200, issued on Nov. 25, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo).

"Method of quality determining of deposition mask, method of manufacturing deposition mask, method of manufacturing deposition mask device, method of selecting deposition mask, and deposition mask" was invented by Chikao Ikenaga (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mas...