US Patent Issued to DAEJIN ADVANCED MATERIALS on March 18 for "Conductive structure and antistatic composition including the same" (South Korean Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,630, issued on March 18, was assigned to DAEJIN ADVANCED MATERIALS INC. (Gyeonggi-do, South Korea).

"Conductive structure and antistatic composition including the same" was invented by Gwan Yeong Kim (Gyeonggi-do, South Korea) and Gi Moon Yoo (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application relates to a conductive structure formed by connecting a modified graphene oxide or modified carbon nanotube with a conductive polymer, and an antistatic composition including the same. The antistatic composition of the present application has advantages of an excellent adhesive property, improved surface roughness...