US Patent Issued to D2S on June 24 for "Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate" (California Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,164, issued on June 24, was assigned to D2S Inc. (San Jose, Calif.).

"Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate" was invented by Akira Fujimura (Saratoga, Calif.), P. Jeffrey Ungar (Belmont, Calif.) and Nagesh Shirali (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems for reticle enhancement technology (RET) for use with variable shaped beam (VSB) lithography include a device configured to determine an initial mask pattern from a desired pattern for a substrate; a device configured to calculate a first substrate pattern from the initial mask pattern; a device co...