US Patent Issued to D2S on June 24 for "Method for computational metrology and inspection for patterns to be manufactured on a substrate" (California Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,495, issued on June 24, was assigned to D2S Inc. (San Jose, Calif.).

"Method for computational metrology and inspection for patterns to be manufactured on a substrate" was invented by Linyong Pang (Monte Sereno, Calif.), Jocelyn Blair (Campbell, Calif.) and Ajay Baranwal (Dublin, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods include generating a scanner aerial image using a neural network, where the scanner aerial image is generated using a mask inspection image that has been generated by a mask inspection machine. Embodiments also include training the neural network with a set of images, such as with a simulated scanner aerial image...