ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,567, issued on April 29, was assigned to D2S Inc. (San Jose, Calif.).
"Method and system for reticle enhancement technology" was invented by Akira Fujimura (Saratoga, Calif.), Nagesh Shirali (San Jose, Calif.) and Ajay Baranwal (Dublin, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods incorporate variable side wall angle (VSA) into calculated patterns, using a mask 3D (M3D) effect. Embodiments include inputting a mask exposure information and determining the M3D effect. Determining the M3D effect may include determining the VSA. Embodiments may include calculating a VSA; and calculating a pattern on a substrate using the calculated VSA, ...