US Patent Issued to Cytec Industries on Feb. 4 for "Stabilizer compositions and methods for using same for protecting polymeric organic materials from UV light and thermal degradation" (Connecticut, New Jersey Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,215,215, issued on Feb. 4, was assigned to Cytec Industries Inc. (Princeton, N.J.).

"Stabilizer compositions and methods for using same for protecting polymeric organic materials from UV light and thermal degradation" was invented by Jerry Mon Hei Eng (Wilton, Conn.), Joseph Kozakiewicz (Trumball, Conn.), Ram B. Gupta (Stamford, Conn.), Jian-Yang Cho (Easton, Conn.), Roderick G. Ryles (Milford, Conn.) and Fadi Khawam (Upper Saddle River, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from an ortho-hydroxy benzophenone, and/or an ...