ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,806, issued on March 18, was assigned to Cymer LLC (San Diego).
"Gas purge systems for a laser source" was invented by Gamaralalage G Padmabandu (San Diego).
According to the abstract* released by the U.S. Patent & Trademark Office: "A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. A...