ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,569, issued on June 17, was assigned to Cymer LLC (San Diego).
"Metrology for improving DUV laser alignment" was invented by Zhong Quan Zhao (San Diego).
According to the abstract* released by the U.S. Patent & Trademark Office: "A light source apparatus includes a gas discharge stage, a sensing apparatus, an optical arrangement, an adjustment apparatus, and a control apparatus. The gas discharge stage includes an optical amplifier including a chamber configured to hold a gas discharge medium outputting a light beam, and a set of optical elements configured to form an optical resonator around the optical amplifier. The optical arrangement is configured to image light from a plura...