US Patent Issued to CUBIXEL on Oct. 7 for "Flying-over beam pattern scanning hologram microscope device using scan mirror and translation stage" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,376, issued on Oct. 7, was assigned to CUBIXEL Co. LTD. (Seoul, South Korea).

"Flying-over beam pattern scanning hologram microscope device using scan mirror and translation stage" was invented by Tae Geun Kim (Seoul, South Korea), Tae Woong Kim (Gwangju-si, South Korea), Seung Ram Lim (Seoul, South Korea), Kyung Beom Kim (Seoul, South Korea), Eung Joon Lee (Seoul, South Korea) and Dong Hwan Im (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A flying-over beam pattern scanning hologram microscope device includes: a scan beam generation unit which converts a first beam and a second beam to a first spherical wave and a second spheric...