US Patent Issued to CUBIXEL on Dec. 9 for "Flying-over beam pattern scanning hologram microscope device using spatial modulation scanner and translation stage" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,175, issued on Dec. 9, was assigned to CUBIXEL Co. LTD. (Seoul, South Korea).

"Flying-over beam pattern scanning hologram microscope device using spatial modulation scanner and translation stage" was invented by Tae Geun Kim (Seoul, South Korea), Seung Ram Lim (Seoul, South Korea), Kyung Beom Kim (Seoul, South Korea), Eung Joon Lee (Seoul, South Korea) and Dong Hwan Im (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A flying-over beam pattern scanning hologram microscope device includes: a scan beam generation unit which converts of a first beam and a second beam to a first spherical wave; a scanning unit, which includes a spatial ...