US Patent Issued to Covestro Deutschland on Sept. 2 for "Photopolymer compositions for thermostable photopolymers in the visible spectral range" (German Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,406,696, issued on Sept. 2, was assigned to Covestro Deutschland AG (Leverkusen, Germany).

"Photopolymer compositions for thermostable photopolymers in the visible spectral range" was invented by Lena Nault (Cologne, Germany), Thomas Roelle (Leverkusen, Germany), Christel Manecke (Hurth, Germany), Richard Meisenheimer (Cologne, Germany) and Friedrich-Karl Bruder (Krefeld, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "Photopolymer compositions include a) matrix polymers, b) writing monomers, c) at least one photoinitiator system, d) optionally at least one non-photopolymerisable component, e) optionally catalysts, radical stabilisers, solvents, ...