US Patent Issued to Coventor on Sept. 23 for "System and method for process window optimization in a virtual semiconductor device fabrication environment" (Massachusetts, New York Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,423,486, issued on Sept. 23, was assigned to Coventor Inc. (Cary, N.C.).

"System and method for process window optimization in a virtual semiconductor device fabrication environment" was invented by William J. Egan (Framingham, Mass.), Anshuman Kunwar (Jamaica Plain, Mass.), Kenneth B. Greiner (Arlington, Mass.) and David M. Fried (South Salem, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A virtual fabrication environment for semiconductor device fabrication that includes an analytics module for performing process window optimization is discussed."

The patent was filed on May 8, 2020, under Application No. 16/870,518.

*For further information,...