US Patent Issued to CORNING on Feb. 18 for "Photo-patternable organic semiconductor (OSC) polymers and methods of formation and applications thereof" (Chinese, American Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,227,613, issued on Feb. 18, was assigned to CORNING Inc. (Corning, N.Y.).

"Photo-patternable organic semiconductor (OSC) polymers and methods of formation and applications thereof" was invented by Mingqian He (Horseheads, N.Y.), Xin Li (Shanghai), Yang Li (Shanghai) and Hongxiang Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method, includes: reacting at least one donor group with at least one protected acceptor group to form a plurality of protecting group-containing OSC polymers; removing the protecting group from the plurality of protecting group-containing OSC polymers to form H-bonding sites; and fusing the H-bonding sites of a fi...