US Patent Issued to Cornell University on Sept. 23 for "Asymmetric multiblock copolymer-homopolymer films, methods of making same, and uses thereof" (American, Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,420,238, issued on Sept. 23, was assigned to Cornell University (Ithaca, N.Y.).

"Asymmetric multiblock copolymer-homopolymer films, methods of making same, and uses thereof" was invented by Ulrich B. Wiesner (Ithaca, N.Y.) and Yusuke Hibi (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Asymmetric films, methods of making asymmetric films, and uses of asymmetric films. A method may include using at least two different solvents and at least one homopolymer and at least one block copolymer that can undergo self assembly, where the solvents are immiscible and have different surface tension, where, on film formation, all or substantially all...