ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,414,404, issued on Sept. 9, was assigned to CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) Ltd. (Hong Kong).

"A/M/X crystalline material, photovoltaic device, and preparation methods thereof" was invented by Shuojian Su (Ningde, China), Zhaohui Liu (Ningde, China), Yandong Wang (Ningde, China), Yanfen Wang (Ningde, China), Yongsheng Guo (Ningde, China), Guodong Chen (Ningde, China) and Chuying Ouyang (Ningde, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "This application provides an A/M/X crystalline material, a photovoltaic device, and preparation methods thereof. The photovoltaic device includes a photoactive crystalline material layer (103). The...