ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,479, issued on Dec. 9, was assigned to CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) Ltd. (Hong Kong).
"Etching device" was invented by Keqiang Li (Ningde, China), Xiaosong Liu (Ningde, China), Zhiyang Wu (Ningde, China) and Yi Lu (Ningde, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided an etching device that is capable of effectively realizing an opening structure with low cost and simplified process. The etching device includes: a porous roller, the porous roller being a hollow structure with openings at both ends, an etching liquid being accommodated in the hollow structure, and the porous roller being provided with a plurality of open...