ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,454, issued on Sept. 30, was assigned to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (Paris).
"Method for the localized deposition of a material on a metal element" was invented by Remi Franiatte (Grenoble, France), Jean Charbonnier (Grenoble, France) and Nadine David (Grenoble, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method is provided for localised deposition of a material over an element, including deposition of a portion of the material over a portion of a surface of a support; positioning of a portion of the element against the portion of the material; annealing of the material portion increasing, at the end ...