US Patent Issued to Commissariat a l'Energie Atomique et aux Energies Alternatives on Sept. 23 for "Method for transferring a layer from a source substrate to a destination substrate" (French Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,497, issued on Sept. 23, was assigned to Commissariat a l'Energie Atomique et aux Energies Alternatives (Paris).

"Method for transferring a layer from a source substrate to a destination substrate" was invented by Julie Widiez (Grenoble, France) and Frank Fournel (Grenoble, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of transferring a layer from a source substrate to a destination substrate, including the following steps: a) arranging a masking disk on a central portion of a bonding surface of said layer and/or of the destination substrate b) implementing an ion etching to form a step in front of a peripheral portion, not covered...