ALEXANDRIA, Va., Feb. 26 -- United States Patent no. 12,233,577, issued on Feb. 25, was assigned to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (Paris).
"Method for manufacturing a mould for nanoprinting and associated mould" was invented by Hubert Teyssedre (Grenoble, France), Nicolas Posseme (Grenoble, France) and Stefan Landis (Grenoble, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a mould for nanoprinting and the associated mould, includes providing a substrate having a layer, and at least one ion implantation configured so as to obtain in the layer, at least one first non-implanted portion or portion having a first implantation, at least one second ...