US Patent Issued to Commissariat a l'Energie Atomique et aux Energies Alternatives on April 29 for "Method for forming patterns on a substrate" (French Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,694, issued on April 29, was assigned to Commissariat a l'Energie Atomique et aux Energies Alternatives (Paris).

"Method for forming patterns on a substrate" was invented by Pierre Montmeat (Grenoble, France) and Franck Fournel (Grenoble, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method comprising the following steps: a) bonding a handle substrate including a base and raised elements to a substrate of interest including a support substrate covered with a thin film, the thin film including a material sensitive to an etchant, whereby the thin film includes first areas not covered with the raised elements and second areas covered with the ...