US Patent Issued to CNBM RESEARCH INSTITUTE FOR ADVANCED GLASS MATERIALS GROUP on Oct. 7 for "Method for optimizing aspect ratio of metal grid based on surface modification" (German Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,439,727, issued on Oct. 7, was assigned to CNBM RESEARCH INSTITUTE FOR ADVANCED GLASS MATERIALS GROUP Co. LTD. (Bengbu, China).

"Method for optimizing aspect ratio of metal grid based on surface modification" was invented by Yilei Shen (Schwetzingen, Germany) and Marko Stoelzel (Munich).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for optimizing the aspect ratio of a metal grid based on surface modification includes: obtaining a photovoltaic module including a front electrode; providing a laser process on the front electrode; and forming protrusion structures on the top of the front electrode by laser induction, at least two rows of protrusion ...