US Patent Issued to CMC Materials on Sept. 30 for "CMP composition including an anionic abrasive" (Taiwanese, American Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,580, issued on Sept. 30, was assigned to CMC Materials LLC (Aurora, Ill.).

"CMP composition including an anionic abrasive" was invented by Yang-Yao Lee (Tainan, Taiwan), Hsin-Yen Wu (Kaohsiung, Taiwan), Kevin P. Dockery (Aurora, Ill.), Na Zhang (Naperville, Ill.) and Chi-Rung Shie (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer."

The patent was filed on Aug. 25, 2022, under Application No. 17/895,967.

*For furth...