ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,457, issued on Nov. 18, was assigned to CMC MATERIALS LLC (Aurora, Ill.).
"Composition for tungsten CMP" was invented by Kevin P. Dockery (Aurora, Ill.), Tyler Carter (Naperville, Ill.), Matthew E. Carnes (Chicago), Jessica VanKuiken (Glendale Heights, Ill.) and Pankaj Singh (Plainfield, Ill.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, abrasive particles dispersed in the liquid carrier, an iron containing accelerator, and a cationic polymer having an amino acid monomer. A method for chemical mechanical polishing a s...