US Patent Issued to CMC Materials on Jan. 20 for "Composition and method for silicon oxide and carbon doped silicon oxide CMP" (Illinois Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,528,973, issued on Jan. 20, was assigned to CMC Materials LLC (Aurora, Ill.).

"Composition and method for silicon oxide and carbon doped silicon oxide CMP" was invented by Steven Kraft (Elgin, Ill.), Fernando Hung Low (Naperville, Ill.), Sudeep Pallikkara Kuttiatoor (Naperville, Ill.), Sarah Brosnan (St. Charles, Ill.), Brian Reiss (Woodridge, Ill.) and Sajo Naik (Naperville, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material includes a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and an organic diacid."

The pate...