US Patent Issued to CLO Virtual Fashion on Aug. 5 for "Faciliating designing of garment by duplicating pattern piece in three-dimensional space" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,376,638, issued on Aug. 5, was assigned to CLO Virtual Fashion Inc. (Seoul, South Korea).

"Faciliating designing of garment by duplicating pattern piece in three-dimensional space" was invented by Hyung Gi Ham (Seoul, South Korea), Jae Hwan Ma (Seoul, South Korea) and Tae Wan Jeong (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The following disclosure relates to a pattern creation simulation method. The pattern creation simulation method may provide a user interface including a first area that controls a plurality of functions for creating or editing a design of a design product in a three-dimensional (3D) virtual space and a second ...