ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,498, issued on July 8, was assigned to Claros Technologies Inc. (Minneapolis).

"Methods and systems of PFAS destruction using UV irradiation at 222 nanometers" was invented by Andrew Thomas Healy (Minneapolis), Evan Anthony Leslie (Minneapolis), Zekun Liu (Brooklyn Park, Minn.), Terrance P. Smith (Woodbury, Minn.) and Joseph Reuel Levine Tirado (Minneapolis).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems and devices for PFAS destruction including adding a sulfite salt to an aqueous solution containing PFAS and then irradiating the aqueous solution with light at 222 nm. The method may include adding a base to the aqueous solution in an...