US Patent Issued to CKD on May 27 for "Substrate foreign matter inspection device and substrate foreign matter inspection method" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,133, issued on May 27, was assigned to CKD Corp. (Aichi, Japan).

"Substrate foreign matter inspection device and substrate foreign matter inspection method" was invented by Naohiro Zaima (Aichi, Japan), Kazuyoshi Kikuchi (Aichi, Japan), Tsuyoshi Ohyama (Aichi, Japan) and Norihiko Sakaida (Aichi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate foreign matter inspection device includes: an image data obtaining device that obtains image data of a target inspection area in the printed circuit board including a printed portion of the solder paste; a storage that stores a neural network and a model, the model being generated by learning o...