ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,295, issued on June 17, was assigned to CHROMA ATE INC. (Taoyuan, Taiwan).
"Wafer inspection system" was invented by Wei-Chih Chen (Taoyuan, Taiwan), Shen-Hao Tsai (Taoyuan, Taiwan) and Yi-Yen Lin (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer inspection system includes a carrier device, a probe card, a first metal kit and a surround separating unit. The probe card includes a detection portion and a conductive layer surrounding the detection portion and disposed on its bottom surface. The first metal kit is configured at a bottom portion of the probe card and coupled to the conductive layer and includes a first window for th...