ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,767, issued on June 10, was assigned to CHROMA ATE INC. (Taoyuan, Taiwan).

"Optical inspection apparatus in semiconductor process system" was invented by Shih-Yao Pan (Taoyuan, Taiwan) and Hung-Tien Kao (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention discloses an optical detection apparatus for defining a detection surface on a carrier unit for a wafer in a semiconductor manufacturing process so as to obtain a corresponding detection image, wherein a vertical movement path for another device to move is defined above the carrier unit. The optical detection apparatus includes a support, and an imaging device dispo...