US Patent Issued to Chengdu BOE Optoelectronics Technology, BOE Technology Group on May 27 for "Mask plate and method for performing evaporation by using the same" (Chinese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,668, issued on May 27, was assigned to Chengdu BOE Optoelectronics Technology Co. Ltd. (Chengdu, China) and BOE Technology Group Co. Ltd. (Beijing).

"Mask plate and method for performing evaporation by using the same" was invented by Qian Li (Beijing) and Jia Zeng (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask plate and a method for performing evaporation by using the mask plate are provided. The mask plate includes: a mask plate body including via holes arranged at intervals, wherein the via hole includes a main hole and an extension hole connected to the main hole, the main hole is configured for enabling evaporated material to pen...