ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,897, issued on July 8, was assigned to CHENGDU BOE OPTOELECTRONICS TECHNOLOGY Co. LTD. (Sichuan, China) and BOE TECHNOLOGY GROUP Co. LTD. (Beijing).

"Mask and manufacturing method therefor" was invented by Yuanqi Zhang (Beijing), Sen Du (Beijing), Chang Luo (Beijing), Fengli Ji (Beijing), Xiaoyu Yang (Beijing) and Qian Xu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask includes a frame, at least one mask sheet, and a shielding plate. The frame includes a plurality of borders. The borders are connected end to end in sequence to form the frame with a first hollow region. A mask sheet includes a pattern region and non-pattern regions. The...