ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,736, issued on Jan. 27, was assigned to CHEMPOLE Co. LTD. (Hwaseong-si, South Korea).
"Anti-reflective hard mask composition" was invented by Sangjun Choi (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An anti-reflective hard mask comprises: (a) a terpolymer in the form of a hetero aromatic represented by chemical formula 1, or a terpolymer blend comprising same; and (b) an organic solvent. wherein in the above Formula, X represents an oxygen, sulfur, or nitrogen atom, and n is 0 or 1, and Z group, as a monomer of the terpolymer, is a C6 to C40 aryl group and a heteroaryl group capable of forming a copolymer with the heteroaro...