ALEXANDRIA, Va., June 17 -- United States Patent no. 12,311,500, issued on May 27, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei, China).

"Polishing liquid supply system, polishing apparatus, exhausting method and polishing method" was invented by Peng Zhang (Hefei, China) and Fan-Wei Liao (Hefei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing liquid supply system, polishing apparatus, exhausting method and polishing method are provided. The system includes a polishing liquid filter; a sensor for detecting whether there are bubbles in the polishing liquid filter; a controller which is connected to the polishing machine and the sensor, and configured to send an exhaust signal when...