US Patent Issued to CHANGXIN MEMORY TECHNOLOGIES on March 25 for "Photomask protection device, photomask protection system, and use method of photomask protection system" (Chinese Inventor)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,648, issued on March 25, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei, China).

"Photomask protection device, photomask protection system, and use method of photomask protection system" was invented by Fei Sun (Hefei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask protection device, a photomask protection system, and a use method of a photomask protection system are provided. The photomask protection device includes a frame and a pellicle. The frame is disposed on a substrate of a photomask and is provided with a clamping space. Edges of the pellicle are fixed in the clamping space."

The patent was filed on Feb. 10, 20...