ALEXANDRIA, Va., June 25 -- United States Patent no. 12,337,359, issued on June 24, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei, China).

"Method and apparatus for detecting wafer cleaning anomalies" was invented by Guobiao Jiang (Hefei, China) and Xiaojun Liu (Hefei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for detecting wafer cleaning anomalies includes: capturing a wafer cleaning video in real time through each of a plurality of cameras of cleaning machines, each camera corresponds to a respective cleaning chamber of one of the cleaning machines, and each cleaning chamber contains a nozzle; performing image processing on each frame of image contained in the wafer cleaning ...