ALEXANDRIA, Va., July 9 -- United States Patent no. 12,353,124, issued on July 8, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei, China).
"Lithography method, lithography apparatus, and computer storage medium" was invented by Heng Wang (Hefei, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure disclose a lithography method, a lithography apparatus, and a computer storage medium. The method includes: determining an exposure intensity of a mask aligner; determining a target preset interval corresponding to the mask aligner according to the exposure intensity; determining, according to the target preset interval, at least one target wafer for which at least one...