ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,756, issued on Oct. 28, was assigned to centrotherm international AG (Blaubeuren, Germany).
"Device, system and method for plasma-enhanced chemical vapor deposition" was invented by Jens-Uwe Fuchs (Blaubeuren, Germany), Mirko Troller (Blaubeuren, Germany), Ralf Reize (Blaubeuren, Germany) and Roland Leichtle (Blaubeuren, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device for plasma-enhanced chemical vapor deposition includes a process chamber configured to receive at least one workpiece carrier. The device is configured to heat the process chamber with the aid of at least one workpiece carrier that can be received by the process chamber...