US Patent Issued to CENTER FOR ADVANCED META-MATERIALS on March 18 for "Carrier substrate and element transfer method using the same" (South Korean Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,098, issued on March 18, was assigned to CENTER FOR ADVANCED META-MATERIALS (Daejeon, South Korea).

"Carrier substrate and element transfer method using the same" was invented by Jae Hyun Kim (Daejeon, South Korea), Jae Gu Kim (Daejeon, South Korea), Sang Min Kim (Daejeon, South Korea), Kwang Seop Kim (Daejeon, South Korea), Yun Hwangbo (Daejeon, South Korea), Hak Joo Lee (Daejeon, South Korea) and Se Jeong Won (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A carrier substrate includes a base layer, an antireflection layer, and an energy absorption layer, wherein the antireflection layer is formed on one surface of the base la...